Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Page Path

4
results for

"Floating island"

Keywords

Publication year

Authors

"Floating island"

Study of the 1,200 V-Class Floating Island IGBT
Ey Goo Kang
J Korean Inst Electr Electron Mater Eng 2016;29(9):523-526.   Published online September 1, 2016
DOI: https://doi.org/10.4313/JKEM.2016.29.9.523
This paper was researched about 1,200 V level floating island IGBT (insulated gate bipolar transistor). Presently, 1,200 V level IGBT is used in Inverter for distributed power generation. We analyzed and compared electrical charateristics of the proposed floating island IGBT and conventional IGBT. For analyzing and comparison, we used T-CAD tool and simulated the electrical charateristics of the devices. And we extracted optimal design and process parameter of the devices. As a result of experiments, we obtained 1,456 V and 1,459 V of breakdown voltages, respectively. And we obatined 4.06 V and 4.09 V of threshold voltages, respectively. On the other hand, on-state voltage drop of floating island IGBT was 3.75 V. but on-state vlotage drop of the conventional IGBT was 4.65 V. Therefore, we almost knew that the proposed floating island IGBT was superior than the conventional IGBT in terms of power dissipation.
  • 74 View
  • 0 Download
Analysis of The Electrical Characteristics of Power MOSFET with Floating Island
Ey Goo Kang
J Korean Inst Electr Electron Mater Eng 2016;29(4):199-204.   Published online April 1, 2016
DOI: https://doi.org/10.4313/JKEM.2016.29.4.199
This paper was proposed floating island power MOSFET for lowering on state resistance and the proposed device was maintained 600 V breakdown voltage. The electrical field distribution of floating island power MOSFET was dispersed to floating island between P-base and N-drift. Therefore, we designed higher doping concentration of drift region than doping concentration of planar type power MOSFET. And so we obtain the lower on resistance than on resistance of planar type power MOSFET. We needed the higher doping concentration of floating island than doping concentration of drift region and needed width and depth of floating island for formation of floating island region. We obtained the optimal parameters. The depth of floating island was 32 ㎛. The doping concentration of floating island was 5 × 1,012 ㎠. And the width of floating island was 3 ㎛. As a result of designing the floating island power MOSFET, we obtained 723 V breakdown voltage and 0.108 Ω㎠ on resistance. When we compared to planar power MOSFET, the on resistance was lowered 24.5% than its of planar power MOSFET. The proposed device will be used to electrical vehicle and renewable industry.
  • 83 View
  • 0 Download
Regular Paper : A Study on Electrical Characteristic Improvement & Design Parameters of Power MOSFET with Single Floating Island Structure
Yu Seup Cho, Man Young Sung
J Korean Inst Electr Electron Mater Eng 2015;28(4):222-228.   Published online April 1, 2015
DOI: https://doi.org/10.4313/JKEM.2015.28.4.222
Power MOSFETs (metal oxide semiconductor field effect transistor) operate as energy control semiconductor switches. In order to reduce energy loss of the device, it is essential to increase its conductance. However, a trade-off relationship between the breakdown voltage and conductance of the device have been the critical difficulty to improve. In this paper, theoretical analysis of electrical benefits on single floating island power MOSFET is proposed. By the method, the optimization point has set defining the doping limit under single floating island structure. The numerical multiple 2.22 was obtained which indicates the doping limit of the original device, improving its ON state voltage drop by 45%.
  • 79 View
  • 0 Download
Electrical Characteristics of Floating Island IGBT Using Trench Gate Structure
Yu Seup Cho, Eun Sik Jung, Kum Mi Oh, Man Young Sung
J Korean Inst Electr Electron Mater Eng 2012;25(4):247-252.   Published online April 1, 2012
DOI: https://doi.org/10.4313/JKEM.2012.25.4.247
IGBT (insulated gate bipolar transistor) has been widely used around the power industry as it has good switching performance and its excellent conductance. In order to reduce power loss during switch turn-on state, it is essential to reduce its resistance. However, trade off relationship between breakdown voltage and device conductance is the greatest obstacle on the way of improvement. Floating island structure is one of the solutions. Still, under optimized device condition for the best performance, improvement rate is negligible. Therefore, this paper suggests adding trench gate on floating island structure to eliminate JFET (junction field effect transistor) area to reduce resistance and activate floating island effect. Experimental result by 2D simulation using TCAD, shows 20% improvement of turn-on state voltage drop.
  • 68 View
  • 0 Download