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"Hafnium oxide"

Liquid Crystal Alignment on Multi-stacked Layer HfO2 Thin Films Using a Solution-process
Dai Hyun Kim
J Electr Electron Mater 2013;26(11):821-825.   Published online November 1, 2013
Effect of multi-stacked layer (MSL), 0.1 mol (M) and 0.3 mol (M) hafnium oxide (HfO2)alignment layers were fabricated via a solution-process for LCs orientation. The solutions were spin-coated and annealed in a furnace. MSL consists of three sub-layers using 0.1 M solution,mono-layer (ML) is composed of 0.3 M HfO2 solution. Then ion-beam irradiation was treated with 1.8keV for 2 min. HfO2-based LC cells were investigated through photographs, pre-tilt angle using crystal rotation method, X-ray photoelectron spectroscopy (XPS) measurement, and surface roughness using atomic force microscopy(AFM) for their characteristic research. Good LC orientation characteristics were observed on MSL HfO2 surface. The LC alignment mechanism on MSL HfO2 and ML HfO2 surfaces was attributed to van der Waals (VDW) interaction between the LC molecular and substrate surface.
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