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"Hole barrier"

A Study on the Selective Hole Carrier Extraction Layer for Application of Amorphous/crystalline Silicon Heterojunction Solar Cell
Yongjun Kim, Sunbo Kim, Youngkuk Kim, Young Hyun Cho, Chang-kyun Park, Junsin Yi
J Electr Electron Mater 2017;30(3):192-197.   Published online March 1, 2017
Hydrogenated Amorphous Silicon (a-Si:H) is used as an emitter layer in HIT (heterojunction with Intrinsic Thin layer) solar cells. Its low band gap and low optical properties (low transmittance and high absorption) cause parasitic absorption on the front side of a solar cell that significantly reduces the solar cell blue response. To overcome this, research on CSC (carrier Selective Contacts) is being actively carried out to reduce carrier recombination and improve carrier transportation as a means to approach the theoretical efficiency of silicon solar cells. Among CSC materials, molybdenum oxide (MoOx) is most commonly used for the hole transport layer (HTL) of a solar cell due to its high work function and wide band gap. This paper analyzes the electrical and optical properties of MoOx thin films for use in the HTL of HIT solar cells. The optical properties of MoOx show better performance than a-Si:H and μc-SiOx:H.
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