Tandem or multijunction solar cells (MJSCs) can convert sunlight into electricity with higher efficiency (η) than single junction solar cells (SJSCs) by dividing the solar irradiance over sub-cells having distinct bandgaps. The efficiencies of various common SJSC materials are close to the edge of their theoretical efficiency and hence there is a tremendous growing interest in utilizing the tandem/multijunction technique. Recently, III-V materials integration on a silicon substrate has been broadly investigated in the development of III-V on Si tandem solar cells. Numerous growth techniques such as heteroepitaxial growth, wafer bonding, and mechanical stacking are crucial for better understanding of high-quality III-V epitaxial layers on Si. As the choice of growth method and substrate selection can significantly impact the quality and performance of the resulting tandem cell and the terminal configuration exhibit a vital role in the overall proficiency. Parallel and Series-connected configurations have been studied, each with its advantage and disadvantages depending on the application and cell configuration. The optimization of both growth mechanisms and terminal configurations is necessary to further improve efficiency and lessen the cost of III-V on Si tandem solar cells. In this review article, we present an overview of the growth mechanisms and terminal configurations with the areas of research that are crucial for the commercialization of III-V on Si tandem solar cells.

This paper is designed to find out where power reaches the highest point as the load of solar cells varies. In addition, the current and power were measured when irradiation changes, and the correlation between current and power was investigated. On top of that, experiments were conducted with the light volume kept constant and with the incoming light angle changing in order to figure out the incoming light angle that produces the most power and to conduct analyses. It was ascertained that if the load increases, the current decreases and the voltage increases. Since the power of 0.9828[W] was the highest when measurements were done, it can be said that when a load of 30[%] is applied to the solar cells, they are the most efficient.

We report the characteristics of thin-film transistor (TFT) to make the bi-channel structure with stacked Mg0.1ZnO0.9O (Mg= 10 at.%) and ZnO. The ZnO and Mg0.1Zn0.9O thin films were deposited by radio frequency (RF) co-sputter system onto the thermally oxidized silicon substrate. A total thickness of active layer was 50 nm. Firstly, the ZnO thin films were deposited to control the thickness from 5 nmto 30 nm. Sequentially, the Mg0.1Zn0.9O thin films were deposited to change from 45 nm to 20 nm. Thebi-layer TFT shows more improved properties than the single layer TFT. The field effect mobility and sub threshold slope for Mg0.1Zn0.9O/ZnO-TFT are 7.40 cm2V-1s-1 and 0.24 V/decade at the ZnO thickness of 10 nm, respectively.

CIGS is one of thin film solar cell and has been studied so much, because of the possibility of low price and high efficiency. Until now, co-evaporation and sputtering were typical method to prepare CIGS absorption layer, and a few company commercialized solar cell by these method. However,non-vacuum process which has been studied for long time has not been progressed, though the merit of low price. Especially, aerosol deposition method has not been reported, because it is difficult to prepare a large quantity of various CIGS powder. In this study, CIGS powder was synthesized by mechanochemical method and CIGS absorption layer was deposited by aerosol deposition method. The thickness of the CIGS layer was controlled by the number of deposition and the surface roughness of it was affected by the amount of flow gas. And, also, I-V curve of it appeared metallic property in the case of ‘as deposition’. After heat treatment in Se-rich atmosphere, the electrical property of it changed to a semiconductor. CdS and transparent conduction layer were formed by a typical method on it for solar cell. The efficiency of cell was appeared 0.19%. Though the efficiency was low because of the disharmony in the after-process, it was conformed that CIGS solar cell could be prepared by aerosol deposition.

The silicon nitride films were prepared by chemical vapor deposition using inductively coupled plasma. During the deposition, the substrate was heated at 150℃ and power 1,000 W. To evolution low temperature manufacture, we have studied the role of source gases, SiH4, NH3, N2, and H2, to produce Si-N and N-H bond in a-SiNx:H film growth. SiH4, NH3, and N2 flow rate fixed at 100, 10, and 10 sccm, H2 flow rate varied from 0 to 10 sccm by small scale. To get the electrical characteristics, we make MIM structure, and analysis surface bonding state. Experimental data show that Si-N and N-H bond is increased and hence electrical characteristics is showed 3 MV/cm breakdown-voltage, and leakage-current 10(-7) A/cm2.