Transparent thin film transistors (TTFT) were fabricated using the rf magnetron sputtered ZnO-SnO2 films as active layers. A ceramic target whose Zn atomic ratio to Sn is 2:1 was employed for the deposition of ZnO-SnO2 films. To study the post-annealing effects on the properties of TTFT, ZnO-SnO2 films were annealed at 200℃ or 400℃ for 5 min before In deposition for source and drain electrodes. Oxygen was added into chamber during sputtering to raise the resistivity of ZnO-SnO2 films. The effects of oxygen addition on the properties of TTFT were also investigated. 100 nm Si3N4 film grown on 100 nm SiO2 film was used as gate dielectrics. The mobility, Ion/Ioff, interface state density etc. were obtained from the transfer characteristics of ZnO-SnO2 TTFTs.