MoS₂ has attracted significant attention as a next-generation semiconductor material to overcome the physical scaling limits of silicon-based devices due to its atomic thinness and excellent electrical properties. However, high contact resistance and the formation of Schottky barriers resulting from interface defects during the metal deposition process remain major bottlenecks that degrade overall device performance and reliability. In this study, we fabricated MoS₂ FETs by employing Sb₂Te₃, van der Waals (vdW) contacts. Minimized interface inhomogeneity was achieved through a hemispherical stamp-based dry transfer of h-BN for device encapsulation. h-BN encapsulation decreased the hysteresis window in the ±25 V gate voltage range from 17 V to 11.5 V compared to un-capped devices, confirming that charge trapping phenomena induced by external environmental factors were suppressed. Consequently, the dry transfer technique of h-BN using a hemispherical stamp demonstrated in this study provides a potential solution for securing the long-term reliability of MoS₂ devices with vdW contact by minimizing interface contamination.

Molybdenum disulfide (MoS₂) is a promising 2D semiconductor material for low-power electronics due to its excellent electrical properties and compatibility with conventional processes. In this study, MoS₂ thin films deposited by RF sputtering were etched using Cl₂/Ar plasma in an ICP system. The effects of Cl₂ gas ratio, RF power, and process pressure on etch rate and MoS₂/SiO₂ selectivity were investigated. Optimal results were obtained at 25% Cl₂, achieving ~38 nm/min etch rate and selectivity of 3.0. Increased source power improved both etch rate and selectivity, while higher bias power enhanced etching but reduced selectivity due to stronger ion bombardment. XPS analysis confirmed Mo－Cl and S－Cl bond formation after etching, indicating chemical reactions and some by-product residue. These results provide insights into optimized plasma etching of sputtered MoS₂ films for advanced 2D device fabrication