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"Nanotechnology"

Capacitance-voltage Characteristics of MOS Capacitors with Ge Nanocrystals Embedded in HfO2 Gate Material
Byoung Jun Park, Hye Ryeong Lee, Kyoung Ah Cho, Sang Sig Kim
J Electr Electron Mater 2008;21(8):699-705.   Published online August 1, 2008
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