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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"Next-generation displays"

Review Paper : A Review : Improvement of Operation Current for Realization of High Mobility Oxide Semiconductor Thin-film Transistors
Kyun Soo Jang, Jayapal Raja, Tae Yong Kim, Seung Min Kang, So Jin Lee, Nguyen Thi Cam Phu, Than Thuy Trinh, Youn Jung Lee, Jun Sin Yi
J Electr Electron Mater 2015;28(6):351-359.   Published online June 1, 2015
Next-generation displays should be transparent and flexible as well as having high resolution and frame number. The main factor for active matrix organic light emitting diode and next-generation displays is the development of TFTs (thin-film transistors) with high mobility and large area uniformity. The TFTs used for transparent displays are mainly oxide TFT that has oxide semiconductor as channel layer. Zinc-oxide based substances such as indium-gallium-zinc-oxide has attracted attention in the display industry. In this paper, the mobility improvement of low cost oxide TFT is studied for fast operating next-generation displays by overcoming disadvantages of amorphous silicon TFT that has low mobility and poly silicon TFT that requires expensive equipment for complex process and doping process.
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