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"Photonic crystal"

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"Photonic crystal"

Regular Paper : Optical Properties of TeOx(2<x<3)/SiO2 One-dimensional Photonic Crystals
Heon Kong, Jong Bin Yeo, Hyun Yong Lee
J Korean Inst Electr Electron Mater Eng 2014;27(12):831-836.   Published online December 1, 2014
DOI: https://doi.org/10.4313/JKEM.2014.27.12.831
One-dimensional (1D) photonic crystals (PCs) were prepared by TeOx(2<x<3)/SiO2 with thedifference refractive index, and fabricated by sputtering technique from a TeO2 and SiO2 target. TheTeOx(2<x<3) layers were fabricated by using the sputtering gas ratio (Ar:O2=40:10). A 10-pair TeOx(2<x<3)/SiO2 1D PCs were fabricated with the structure parameters of filling factor=0.5185, and period=410nm. The properties of 1D PCs with and without a defect layer were evaluated by UV-VIS-NIR. Anormal mode 1D PC have a photonic band gap (PBG) in the near infrared (NIR) region from 1,203 to1,421 nm. In the case of 1D PC containing a defect layer, a defect level appears at 1,291 nm. Themeasured transmittance (T) spectra are nearly corresponding to calculated results. After He-Cd laserexposure, the defect level is shifted from 1,291 nm to 1,304 nm.
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Thin Films and Sensors : Characteristics Analysis of Total Internal Reflection-based Dielectric Multi-Layer Sensor Using Plasmonics Phenomena
Hong Seung Kim, Tae Kyeong Lee, Doo Gun Kim, You Ra Jung, Geum Yoon Oh, Byeong Hyeon Lee, Hyun Chul Ki, Young Wan Choi
J Korean Inst Electr Electron Mater Eng 2012;25(7):516-520.   Published online July 1, 2012
DOI: https://doi.org/10.4313/JKEM.2012.25.7.516
In this paper, we have theoretically analyzed and designed a dielectric multi-layer sensor with a SPR (surface plasmon resonance) using analytical calculation and FDTD (finite difference time-domain) methods. The proposed structure is composed of periodic layer and thin metal film. It has many advantages. One of that is a high sensitivity of the SPR. Another is a high Q-factor of the characteristics in the PhC (photonic crystals) micro-cavity structure. The incident light has double resonance characteristics, because the filtered light by PhC structure, dielectric multi-layer, is met the thin metal film for SPR effect. We have also observed the change of resonance characteristics according to the variation of effective index on the metal film.
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Fabrication of Pair-Photonic Crystal Arrays using Multiple-Exposure Nanosphere Lithography
Jong Bin Yeo, Gwang Min Han, Hyun Yong Lee
J Korean Inst Electr Electron Mater Eng 2010;23(3):245-249.   Published online March 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.3.245
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Properties of Zero Group Velocity in 2-dimensional Photonic Crystal
Gyeong Rae Kim, Myoung Rae Lee, Won Jin Shin, Chang Kyo Kim, Chin Soo Hong
J Korean Inst Electr Electron Mater Eng 2010;23(2):137-142.   Published online February 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.2.137
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Small Group Velocity of Line Defect in Two-dimensional Photonic Crystal
Myoung Rae Lee, Gyeong Rae Kim, Won Jin Shin, Chang Kyo Kim, Chin Soo Hong
J Korean Inst Electr Electron Mater Eng 2010;23(2):128-132.   Published online February 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.2.128
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Fabrications and Characterizations of InGaN/GaN Quantum Well Light Emitting Devices Including Photonic Crystal Nanocavity Structures
Jae Ho Choi, Jung Tack Lee, Keun Joo Kim
J Korean Inst Electr Electron Mater Eng 2009;22(12):1045-1057.   Published online December 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.12.1045
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Characteristics of the Photonic Bandgaps in Two-dimensional Photonic Crystals with a Square Lattice by FDTD Simulation
Jong Bin Yeo, Hoe Young Yang, Hyun Yong Lee
J Korean Inst Electr Electron Mater Eng 2009;22(1):61-66.   Published online January 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.1.061
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The Characteristic Study of Amorphous Chalcogenide As-Ge-Se-S Thin Film for Photonic Crystal Application
Ki Hyun Nam, Long Yun Ju, Hyuk Choi, Hong Bay Chung
J Korean Inst Electr Electron Mater Eng 2008;21(6):580-583.   Published online June 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.6.580
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A Study on the Holographic Process for Photonic Crystal Fabrication
J Korean Inst Electr Electron Mater Eng 2007;20(8):726-730.   Published online August 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.8.726
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Dry-etch Characteristics of InP/InGaAsP Photonic Crystal Structure
J Korean Inst Electr Electron Mater Eng 2004;17(12):1271-1276.   Published online December 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.12.1271
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Optical Devices : Fabrication Technology for Improving Pattern Quality in Two-Dimensional Photonic Crystal Structure
Hae Sung Kim, Dong Hoon Shin, Soon Koo Kim, Jin Koo Rhee, Beom Seok Lee, Hye Won Kim, Jae Un Lee, Young Soo Han, Young Ho Choe
J Korean Inst Electr Electron Mater Eng 2003;16(6):515-521.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.515
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