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"Photoresist"

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"Photoresist"

Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim
J Korean Inst Electr Electron Mater Eng 2010;23(5):353-357.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.353
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A Study on the Realization of the High Efficiency LCD Photoresist Removal Technology
J Korean Inst Electr Electron Mater Eng 2007;20(11):977-982.   Published online November 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.11.977
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Effect of Aromatic Acid Amplifier, 2-hydroxy-2`-tosyloxy Biphenyl, on the kind of Resist Resins
J Korean Inst Electr Electron Mater Eng 2005;18(6):499-505.   Published online June 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.6.499
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A Study on Photoresist Strip Process using DIO3
J Korean Inst Electr Electron Mater Eng 2004;17(11):1143-1148.   Published online November 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.11.1143
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Synthesis and Characterization of Novel Acid Amplifiers with a Low Absorbance at 193 nm
J Korean Inst Electr Electron Mater Eng 2004;17(8):806-811.   Published online August 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.8.806
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