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SiO(x) Layer
WHERE t1.sid in(parameter_dbtbl_keyword '%SiO(x) Layer%') and t1.xml_status <> 99
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"SiO(x) Layer"
Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure
Kun Ho Bae, Seung Woo Do, Jae Sung Lee, Yong Hyun Lee
J Korean Inst Electr Electron Mater Eng
2009;22(2):101-106.
Published online February 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.2.101
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