An all-solid-state electrochromic film was fabricated by laminating tungsten oxide (WO₃) and nickel oxide (NiO) thin films deposited by a reactive DC magnetron sputtering on flexible ITO films. The influence of oxygen partial pressure on the crystal structure, microstructure, optical properties, and electrochromic properties of WO₃ and NiO thin films were investigated. WO₃ and NiO films showed the best electrochromic properties under the flow of Ar:O₂=80:20 and Ar:O₂=90:10, respectively. The EC film fabricated with an optimized WO₃ and NiO films showed a high coloration efficiency, a fast response time, and a stable optical modulation. It is expected that flexible EC window films will pave the way for the next-generation energy-saving windows.