Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

반도체 / Attenuated Phase Shift Mask 에 근접 효과 보정을 적용한 고립 패턴의 해상 한계 분석

김종선, 오용호, 임성우, 고춘수, 이재철

Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correctin Method with Attenuated Phase Shift Mask

Jong Sun Kim, Yong Ho Oh, Sung Woo Lim, Chun Soo Go, Jai Choel Lee
J Electr Electron Mater 2000;13(11):901-907.
Published online: November 1, 2000
  • 3 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correctin Method with Attenuated Phase Shift Mask
J Electr Electron Mater. 2000;13(11):901-907.   Published online November 1, 2000
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correctin Method with Attenuated Phase Shift Mask
J Electr Electron Mater. 2000;13(11):901-907.   Published online November 1, 2000
Close

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.