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반도체 : STI - CMP 공정에서 Torn oxide 결함 해결에 관한 연구

서용진, 정헌상, 김상용, 이우선, 이강현, 장의구

A Study for the Improvement of Torn Oxide Defects in Shallow Trench Isolation - Chemical Mechanical Polishing ( STI - CMP ) Process

Yong Jin Seo, Hun Sang Chung, Sang Yong Kim, Woo Sun Lee, Kang Hyun Lee, Eui Goo Chang
J Electr Electron Mater 2001;14(1):1-5.
Published online: January 1, 2001
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A Study for the Improvement of Torn Oxide Defects in Shallow Trench Isolation - Chemical Mechanical Polishing ( STI - CMP ) Process
J Electr Electron Mater. 2001;14(1):1-5.   Published online January 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Include:
A Study for the Improvement of Torn Oxide Defects in Shallow Trench Isolation - Chemical Mechanical Polishing ( STI - CMP ) Process
J Electr Electron Mater. 2001;14(1):1-5.   Published online January 1, 2001
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