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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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새로운 ICP 장치를 이용한 고온 초전도체의 Dry Etching 과 기존의 Wet Etching 기술과의 비교

강형곤, 임성훈, 임연호, 한윤봉, 한병성, 황종선

Comparison of the Existing Wet Etching and the Dry Etching with the ICP Process Method

Hyeong Gon Kang, Sung Hun Lim, Yeon Ho Im, Yoon Bong Hahn, Byung Sung Han, Chong Sun Hwang
J Electr Electron Mater 2001;14(2):158-162.
Published online: February 1, 2001
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Comparison of the Existing Wet Etching and the Dry Etching with the ICP Process Method
J Electr Electron Mater. 2001;14(2):158-162.   Published online February 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Comparison of the Existing Wet Etching and the Dry Etching with the ICP Process Method
J Electr Electron Mater. 2001;14(2):158-162.   Published online February 1, 2001
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