Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

고전압 : 질화탄소 박막 증착 시 고전압 방전 플라즈마에 가한 자장의 영향

김종일, 배선기

High Voltage Engineering : Influence of a Magnetic Field on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition

Jong Il Kim, Seon Gi Bae
J Electr Electron Mater 2002;15(2):184-189.
Published online: February 1, 2002
  • 4 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

High Voltage Engineering : Influence of a Magnetic Field on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition
J Electr Electron Mater. 2002;15(2):184-189.   Published online February 1, 2002
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
High Voltage Engineering : Influence of a Magnetic Field on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition
J Electr Electron Mater. 2002;15(2):184-189.   Published online February 1, 2002
Close

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.