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Enhanced - Inductively Coupled Plasma ( E - ICP ) 를 이용한 Silylated Photoresist 식각공정개발

조수범, 김진우, 정재성, 오범환, 박세근, 이종근

The Development of Silylated Photoresist Etch Process by Enhanced - Inductively Coupled Plasma

Soo Beom Jo, Chin Woo Kim, Jae Seong Jeong, Beom Hoan O, Se Geun Park, Jong Geun Lee
J Korean Inst Electr Electron Mater Eng 2002;15(3):227-232.
Published online: March 1, 2002
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The Development of Silylated Photoresist Etch Process by Enhanced - Inductively Coupled Plasma
J Korean Inst Electr Electron Mater Eng. 2002;15(3):227-232.   Published online March 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.3.227
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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The Development of Silylated Photoresist Etch Process by Enhanced - Inductively Coupled Plasma
J Korean Inst Electr Electron Mater Eng. 2002;15(3):227-232.   Published online March 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.3.227
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