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기계화학적 연마를 이용한 트렌치 구조의 산화막 평탄화

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Oxide Planarization of Trench Structure using Chemical Mechanical Polishing ( CMP )

Chul Bok Kim, Sang Yong Kim, Yong Jin Seo
J Electr Electron Mater 2002;15(10):838-843.
Published online: October 1, 2002
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Oxide Planarization of Trench Structure using Chemical Mechanical Polishing ( CMP )
J Electr Electron Mater. 2002;15(10):838-843.   Published online October 1, 2002
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Oxide Planarization of Trench Structure using Chemical Mechanical Polishing ( CMP )
J Electr Electron Mater. 2002;15(10):838-843.   Published online October 1, 2002
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