Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

디스플레이 : 스퍼터링 방법으로 증착된 하층 NiFe 코어를 갖는 박막인덕터의 CMOS 집적화 공정

박일용, 김상기, 구진근, 노태문, 이대우, 김종대

Display : Fully CMOS-compatible Process Integration of Thin Film Inductor with a Sputtered Bottom NiFe Core

II Yong Park, Sang Gi Kim, Jin Gun Koo, Tae Moon Roh, Dae Woo Lee, Jong Dae Kim
J Electr Electron Mater 2003;16(2):138-143.
Published online: February 1, 2003
  • 5 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Display : Fully CMOS-compatible Process Integration of Thin Film Inductor with a Sputtered Bottom NiFe Core
J Electr Electron Mater. 2003;16(2):138-143.   Published online February 1, 2003
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Display : Fully CMOS-compatible Process Integration of Thin Film Inductor with a Sputtered Bottom NiFe Core
J Electr Electron Mater. 2003;16(2):138-143.   Published online February 1, 2003
Close