Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구

박재화, 김경태, 김동표, 김창일, 장의구

Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

Jae Hwa Park, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng 2003;16(6):449-453.
Published online: June 1, 2003
  • 31 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma
J Korean Inst Electr Electron Mater Eng. 2003;16(6):449-453.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.449
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma
J Korean Inst Electr Electron Mater Eng. 2003;16(6):449-453.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.449
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.