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고전압 : 논문 16-7-15 ; 펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성

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High Voltage Engineering : Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma

Jong Il Kim
J Electr Electron Mater 2003;16(7):641-646.
Published online: July 1, 2003
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High Voltage Engineering : Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma
J Electr Electron Mater. 2003;16(7):641-646.   Published online July 1, 2003
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
High Voltage Engineering : Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma
J Electr Electron Mater. 2003;16(7):641-646.   Published online July 1, 2003
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