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N2O 가스로 열산화된 게이트 유전체의 특성

김창일, 장의구

Properties of the gate dielectrics by thermal oxidation in N2O gas

Chang iL Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng 1993;6(1):55-61.
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Properties of the gate dielectrics by thermal oxidation in N2O gas
J Korean Inst Electr Electron Mater Eng. 1993;6(1):55-61.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Properties of the gate dielectrics by thermal oxidation in N2O gas
J Korean Inst Electr Electron Mater Eng. 1993;6(1):55-61.
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