Role of Oxidants for Metal CMP Applications

Yong Jin Seo; Sang Yong Kim; U Seon Lee

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금속 CMP 적용을 위한 산화제의 역할

서용진, 김상용, 이우선

Role of Oxidants for Metal CMP Applications

Yong Jin Seo, Sang Yong Kim, U Seon Lee

J Electr Electron Mater 2004;17(4):378-383.
Published online: April 1, 2004

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Keywords: CMP (chemical mechanical polishing), Oxidizer, Slurry, Selectivity, Removal rate

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Role of Oxidants for Metal CMP Applications

J Electr Electron Mater. 2004;17(4):378-383. Published online April 1, 2004

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Role of Oxidants for Metal CMP Applications

J Electr Electron Mater. 2004;17(4):378-383. Published online April 1, 2004

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금속 CMP 적용을 위한 산화제의 역할

Role of Oxidants for Metal CMP Applications

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