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Nano-scale CMOS를 위한 Ni-germano Silicide의 열 안정성 연구

황빈봉, 오순영, 윤장근, 김용진, 지희환, 김용구, 왕진석, 이희덕

Study of Ni-germano Silicide Thermal Stability for Nano-scale CMOS Technology

, , , , , , ,
J Electr Electron Mater 2004;17(11):1149-1155.
Published online: November 1, 2004
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Study of Ni-germano Silicide Thermal Stability for Nano-scale CMOS Technology
J Electr Electron Mater. 2004;17(11):1149-1155.   Published online November 1, 2004
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Study of Ni-germano Silicide Thermal Stability for Nano-scale CMOS Technology
J Electr Electron Mater. 2004;17(11):1149-1155.   Published online November 1, 2004
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