Study on Properties Change of a-C Thin Film by N2 Plasma Treatment

K. Y. Lee; S. Honda; M. Katayama; K. Oura

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질소 플라즈마 처리에 의한 a-C 박막의 전계방출특성 변화에 관한 연구

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Study on Properties Change of a-C Thin Film by N2 Plasma Treatment

K. Y. Lee, S. Honda, M. Katayama, K. Oura

J Electr Electron Mater 2004;17(12):1332-1336.
Published online: December 1, 2004

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Keywords: Plasma treatment, Amorphous carbon, Field emission, Scanning electron microscopy, Raman spectroscopy, XPS

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Study on Properties Change of a-C Thin Film by N2 Plasma Treatment

J Electr Electron Mater. 2004;17(12):1332-1336. Published online December 1, 2004

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Study on Properties Change of a-C Thin Film by N2 Plasma Treatment

J Electr Electron Mater. 2004;17(12):1332-1336. Published online December 1, 2004

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질소 플라즈마 처리에 의한 a-C 박막의 전계방출특성 변화에 관한 연구

Study on Properties Change of a-C Thin Film by N2 Plasma Treatment

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