Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

레이디얼 베이시스 함수망을 이용한 플라즈마 식각공정 모델링

박경영, 김병환

Modeling of Plasma Etch Process using a Radial Basis Function Network

,
J Electr Electron Mater 2005;18(1):1-5.
Published online: January 1, 2005
  • 5 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Modeling of Plasma Etch Process using a Radial Basis Function Network
J Electr Electron Mater. 2005;18(1):1-5.   Published online January 1, 2005
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Modeling of Plasma Etch Process using a Radial Basis Function Network
J Electr Electron Mater. 2005;18(1):1-5.   Published online January 1, 2005
Close