Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

레이디얼 베이시스 함수망을 이용한 플라즈마 식각공정 모델링

박경영, 김병환

Modeling of Plasma Etch Process using a Radial Basis Function Network

,
J Korean Inst Electr Electron Mater Eng 2005;18(1):1-5.
Published online: January 1, 2005
  • 29 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Modeling of Plasma Etch Process using a Radial Basis Function Network
J Korean Inst Electr Electron Mater Eng. 2005;18(1):1-5.   Published online January 1, 2005
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Modeling of Plasma Etch Process using a Radial Basis Function Network
J Korean Inst Electr Electron Mater Eng. 2005;18(1):1-5.   Published online January 1, 2005
Close