Work Function Changes on MgO Protective Layer after O2-plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

doi:10.4313/JKEM.2005.18.3.259

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산소 플라즈마 처리후의 이차전자방출계수(γ)를 이용한 MgO 보호막의 일함수(Фw) 변화

정재천, 유세기, 조재원

Work Function Changes on MgO Protective Layer after O2-plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

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J Korean Inst Electr Electron Mater Eng 2005;18(3):259-263.
Published online: March 1, 2005

DOI: https://doi.org/10.4313/JKEM.2005.18.3.259

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Keywords: MgO protective Layer, Plasma treatment, Secondary electron emission coefficient(γ), Work function(Фw), γ-focused ion beam(γ-FIB)

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Work Function Changes on MgO Protective Layer after O2-plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

J Korean Inst Electr Electron Mater Eng. 2005;18(3):259-263. Published online March 1, 2005

DOI: https://doi.org/10.4313/JKEM.2005.18.3.259

Download Citation

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bib — For JabRef, BibDesk, and other BibTeX-specific software

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Work Function Changes on MgO Protective Layer after O2-plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

J Korean Inst Electr Electron Mater Eng. 2005;18(3):259-263. Published online March 1, 2005

DOI: https://doi.org/10.4313/JKEM.2005.18.3.259

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산소 플라즈마 처리후의 이차전자방출계수(γ)를 이용한 MgO 보호막의 일함수(Фw) 변화

Work Function Changes on MgO Protective Layer after O2-plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

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