A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement

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0.13㎛ Cu/Low-k 공정 Setup과 수율 향상에 관한 연구

이현기, 장의구

A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement

J Electr Electron Mater 2007;20(4):325-331.
Published online: April 1, 2007

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Keywords: Low-k, Black diamond, Ash, Cleaning, Yield, Chemical mechanical planarization, CMP

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A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement

J Electr Electron Mater. 2007;20(4):325-331. Published online April 1, 2007

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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bib — For JabRef, BibDesk, and other BibTeX-specific software

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A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement

J Electr Electron Mater. 2007;20(4):325-331. Published online April 1, 2007

Articles

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0.13㎛ Cu/Low-k 공정 Setup과 수율 향상에 관한 연구

A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement

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