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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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온도 , 가스량 및 도핑시간 변화에 따른 POCl3 도핑 공정의 최적화

정경화, 강정진

Optimization of the POCl3 doping process according to the variation of deposition temperature , gas flow rate and doping time

Kyung hwa Jung, Jeong Jin Kang
J Electr Electron Mater 1994;7(3):206-212.
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Optimization of the POCl3 doping process according to the variation of deposition temperature , gas flow rate and doping time
J Electr Electron Mater. 1994;7(3):206-212.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Optimization of the POCl3 doping process according to the variation of deposition temperature , gas flow rate and doping time
J Electr Electron Mater. 1994;7(3):206-212.
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