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산화막 CMP에서 발생하는 온도가 연마특성에 미치는 영향

김영진, 박범영, 김형재, 정해도

Effect of Temperature on Polishing Properties in Oxide CMP

Young Jin Kim, Boum Young Park, Hyoung Jae Kim, Hae Do Jeong
J Korean Inst Electr Electron Mater Eng 2008;21(2):93-98.
Published online: February 1, 2008
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Effect of Temperature on Polishing Properties in Oxide CMP
J Korean Inst Electr Electron Mater Eng. 2008;21(2):93-98.   Published online February 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.2.093
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Include:
Effect of Temperature on Polishing Properties in Oxide CMP
J Korean Inst Electr Electron Mater Eng. 2008;21(2):93-98.   Published online February 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.2.093
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