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BTMSM/O2 유량변화에 따른 SiOCH 박막의 유전상수 특성

김종욱, 황창수, 김홍배

Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates

Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(4):362-367.
Published online: April 1, 2008
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Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
J Korean Inst Electr Electron Mater Eng. 2008;21(4):362-367.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.362
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
J Korean Inst Electr Electron Mater Eng. 2008;21(4):362-367.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.362
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