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Hard Coating 응용을 위한 DC 마크네트론 스퍼터링 방법을 이용한 증착한 TiN 박막의 특성에 대한 연구

김영열, 박용섭, 최원석, 횽병유

Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

Young Ryeol Kim, Yong Seob Park, Won Seok Choi, Byung You Hong
J Electr Electron Mater 2008;21(7):660-664.
Published online: July 1, 2008
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Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings
J Electr Electron Mater. 2008;21(7):660-664.   Published online July 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings
J Electr Electron Mater. 2008;21(7):660-664.   Published online July 1, 2008
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