Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

Young Ryeol Kim; Yong Seob Park; Won Seok Choi; Byung You Hong

doi:10.4313/JKEM.2008.21.7.660

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Hard Coating 응용을 위한 DC 마크네트론 스퍼터링 방법을 이용한 증착한 TiN 박막의 특성에 대한 연구

김영열, 박용섭, 최원석, 횽병유

Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

Young Ryeol Kim, Yong Seob Park, Won Seok Choi, Byung You Hong

J Korean Inst Electr Electron Mater Eng 2008;21(7):660-664.
Published online: July 1, 2008

DOI: https://doi.org/10.4313/JKEM.2008.21.7.660

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Keywords: Sputtering, TiN, Hardness, Adhesion

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Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

J Korean Inst Electr Electron Mater Eng. 2008;21(7):660-664. Published online July 1, 2008

DOI: https://doi.org/10.4313/JKEM.2008.21.7.660

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Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

J Korean Inst Electr Electron Mater Eng. 2008;21(7):660-664. Published online July 1, 2008

DOI: https://doi.org/10.4313/JKEM.2008.21.7.660

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Hard Coating 응용을 위한 DC 마크네트론 스퍼터링 방법을 이용한 증착한 TiN 박막의 특성에 대한 연구

Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

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