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Facing targets sputtering system 에서 TbFeCo 박막의 산화에 미치는 제조조건의 영향

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The effect of deposition condition on the oxidation of TbFeCo thin films in facing targets sputtering system

Jeong Tak Moon, Myung Han Kim
J Electr Electron Mater 1994;7(6):511-519.
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The effect of deposition condition on the oxidation of TbFeCo thin films in facing targets sputtering system
J Electr Electron Mater. 1994;7(6):511-519.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
The effect of deposition condition on the oxidation of TbFeCo thin films in facing targets sputtering system
J Electr Electron Mater. 1994;7(6):511-519.
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