Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma

Xue Yang; Doo Seung Um; Gwan Ha Kim; Sang Hun Song; Chang Il Kim

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Cl2/Ar 플라즈마를 이용한 Al2O3 박막의 식각

양설, 엄두승, 김관하, 송상헌, 김창일

Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma

Xue Yang, Doo Seung Um, Gwan Ha Kim, Sang Hun Song, Chang Il Kim

J Electr Electron Mater 2009;22(12):1005-1008.
Published online: December 1, 2009

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Keywords: Dry etching, ACP, Al2O3, Cl2/Ar, Temperature

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Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma

J Electr Electron Mater. 2009;22(12):1005-1008. Published online December 1, 2009

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma

J Electr Electron Mater. 2009;22(12):1005-1008. Published online December 1, 2009

Fabrication and Evaluation of Thin Film Transistors

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Cl2/Ar 플라즈마를 이용한 Al2O3 박막의 식각

Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma

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