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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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CF4 와 O2 혼합 가스를 이용한 산화막과 질화막의 선택적 식각에 관한 연구

김주민, 원태영

Selective Etch of Silicon Nitride , and Silicon dioxide upon O2 Dilution of CF4 Plasmas

Ju Min Kim, Tae Young Won
J Electr Electron Mater 1995;8(1):90-94.
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Selective Etch of Silicon Nitride , and Silicon dioxide upon O2 Dilution of CF4 Plasmas
J Electr Electron Mater. 1995;8(1):90-94.
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Selective Etch of Silicon Nitride , and Silicon dioxide upon O2 Dilution of CF4 Plasmas
J Electr Electron Mater. 1995;8(1):90-94.
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