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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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RF Sputter 에 의한 SiNy 막 제작에서의 산소 주입효과

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Oxygen Effect of SiOxNy Films by RF Sputter

Sung Hwan Im
J Electr Electron Mater 1989;2(1):25-32.
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Oxygen Effect of SiOxNy Films by RF Sputter
J Electr Electron Mater. 1989;2(1):25-32.
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Oxygen Effect of SiOxNy Films by RF Sputter
J Electr Electron Mater. 1989;2(1):25-32.
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