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박막트랜지스터의 병렬형 가역과 비가역 문턱전압 이동에 대한 모델링

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Modeling of Reversible and Irreversible Threshold Voltage Shift in Thin-film Transistors

Tae Ho Jung
J Electr Electron Mater 2016;29(7):387-393.
Published online: July 1, 2016
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Threshold voltage shift has been observed from many thin-film transistors (TFTs) and the time evolution of the shift can be modeled as the stretched-exponential and -hyperbola function. These analytic models are derived from the kinetic equation for defect-creation or charge-trapping and the equation consists of only reversible reactions. In reality TFT``s a shift is permanent due to an irreversible reaction and, as a result, it is reasonable to consider that both reversible and irreversible reactions exist in a TFT. In this paper the case when both reactions exist in parallel and make a combined threshold voltage shift is modeled and simulated. The results show that a combined threshold voltage shift observed from a TFT may agrees with the analytic models and, thus, the analytic models don``t guarantee whether the cause of the shift is defection-creation or charge-trapping.

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Modeling of Reversible and Irreversible Threshold Voltage Shift in Thin-film Transistors
J Electr Electron Mater. 2016;29(7):387-393.   Published online July 1, 2016
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Modeling of Reversible and Irreversible Threshold Voltage Shift in Thin-film Transistors
J Electr Electron Mater. 2016;29(7):387-393.   Published online July 1, 2016
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