TeOx thin films were deposited at various O2/Ar gas-flow ratios by a reactive RFmagneton sputtering technique from TeO2 and Te targets. X-ray diffraction (XRD) results revealed that the TeOx thin films were amorphous. The structure and chemical composition of the TeOx thin films were investigated by fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The optical characteristics of the TeOx thin films were investigated by an Ellipsometer and a UV-VIS-NIR spectrophotometer. According to the O2/Ar gas-flow ratios, the atomic composition ratio of TeOx thin films was divided into two regions(x=1-2, 2-3). Different optical characteristics were shown in each region. With an increasing O2/Ar gas-flow ratio, the refractive index of the TeOx thin films decreased and the optical bandgap of the films increased.
