Surface Properties of Al ( Si , Cu ) Alloy Film after Plasma Etching

Jin Kun Goo; Chang Il Kim; Hyung Ho Park; Kwang Ho Kwon; Yeoung Cheol Hyeon; Kyung Soo Suh; Kee Soo Nam

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Al ( Si , Cu ) 합금막의 플라즈마 식각후 표면 특성

구진근, 김창일, 박형호, 권광호, 현영철, 서경수, 남기수

Surface Properties of Al ( Si , Cu ) Alloy Film after Plasma Etching

Jin Kun Goo, Chang Il Kim, Hyung Ho Park, Kwang Ho Kwon, Yeoung Cheol Hyeon, Kyung Soo Suh, Kee Soo Nam

J Electr Electron Mater 1996;9(3):291-296.

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Surface Properties of Al ( Si , Cu ) Alloy Film after Plasma Etching

J Electr Electron Mater. 1996;9(3):291-296.

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Surface Properties of Al ( Si , Cu ) Alloy Film after Plasma Etching

J Electr Electron Mater. 1996;9(3):291-296.

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Al ( Si , Cu ) 합금막의 플라즈마 식각후 표면 특성

Surface Properties of Al ( Si , Cu ) Alloy Film after Plasma Etching

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