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ICP 에 의한 BCl3/Cl2 플라즈마 내에서 Pt 박막의 식각특성

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Properties of the Pt Thin Film Etching in BCl3/Cl2 gas by Inductive Coupled Plasmas

Chang Il Kim, Kwang Ho Kwan
J Electr Electron Mater 1998;11(10):804-808.
Published online: October 1, 1998
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Properties of the Pt Thin Film Etching in BCl3/Cl2 gas by Inductive Coupled Plasmas
J Electr Electron Mater. 1998;11(10):804-808.   Published online October 1, 1998
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Properties of the Pt Thin Film Etching in BCl3/Cl2 gas by Inductive Coupled Plasmas
J Electr Electron Mater. 1998;11(10):804-808.   Published online October 1, 1998
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