Surface characteristic of silicon - oxide film by CMP polishing

Hyun Soo Lee; Sung Hun Lim; Min Ki Kim; Byoung Sung Han

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초전도 자성체 : CMP 연마에 의한 실리콘산화막의 표면특성

이현수, 임성훈, 김민기, 한병성

Surface characteristic of silicon - oxide film by CMP polishing

Hyun Soo Lee, Sung Hun Lim, Min Ki Kim, Byoung Sung Han

J Electr Electron Mater 1999;12(7):650-656.
Published online: July 1, 1999

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Surface characteristic of silicon - oxide film by CMP polishing

J Electr Electron Mater. 1999;12(7):650-656. Published online July 1, 1999

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Surface characteristic of silicon - oxide film by CMP polishing

J Electr Electron Mater. 1999;12(7):650-656. Published online July 1, 1999

Articles

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초전도 자성체 : CMP 연마에 의한 실리콘산화막의 표면특성

Surface characteristic of silicon - oxide film by CMP polishing

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