Journal of Electrical and Electronic Materials

A Study on the Orientation and the Roughness with the Deposition Condition of AIN Thin Films Prepared by RF Magnetron Sputtering Method: J Korean Inst Electr Electron Mater Eng 2004;17(10):1023-1028. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1023

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Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process: J Korean Inst Electr Electron Mater Eng 2004;17(10):1029-1033. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1029

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Characteristics of Anode Current due to the Impurity Concentration and the Channel Length of Lateral MOS-controlled Thyristor: J Korean Inst Electr Electron Mater Eng 2004;17(10):1034-1040. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1034

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Characteristics of Friction Affecting CMP Results: J Korean Inst Electr Electron Mater Eng 2004;17(10):1041-1048. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1041

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Effect of pad’s surface deformation and oscillation on monocrystalline silicon wafer surface quality
Woong-Kirl Choi, Seong-Hyun Kim, Seung-Geon Choi, Eun-Sang Lee, Chul-Hee Lee
International Journal of Precision Engineering and Manufacturing.2014; 15(11): 2301. CrossRef
Evaluation of the wafer polishing pad capacity and lifetime in the machining of reliable elevations
Eun-Sang Lee, Ji-Wan Cha, Seong-Hyun Kim
International Journal of Machine Tools and Manufacture.2013; 66: 82. CrossRef

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Effect of Abrasive Particles on Frictional Force and Abrasion in Chemical Mechanical Polishing(CMP): J Korean Inst Electr Electron Mater Eng 2004;17(10):1049-1055. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1049

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Two-Step Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
Weilei Wang, Weili Liu, Zhitang Song
ECS Journal of Solid State Science and Technology.2021; 10(7): 074004. CrossRef

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Dielectric and Piezoelectric Properties of Pb-free Bi(Na,K)TiO3-SrTiO3 Ceramics with MnO2 Addition: J Korean Inst Electr Electron Mater Eng 2004;17(10):1056-1060. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1056

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Characterization of Ferroelectric Thin Film in Microwave Region: J Korean Inst Electr Electron Mater Eng 2004;17(10):1061-1068. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1061

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Investigation of Surface Degradation in Silicone Rubber Due to Corona Exposure: J Korean Inst Electr Electron Mater Eng 2004;17(10):1068-1078. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1068

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Electric and Mechanical Properties of CMC+PTFE Binary Binder Electrode for Electric Double Layer Capacitor: J Korean Inst Electr Electron Mater Eng 2004;17(10):1079-1084. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1079

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Effect of Acid / Heat Treatment on Electric Double Layer Performance of Needle Cokes
Sun-Hye Yang, Ick-Jun Kim, In-Sik Choi, Hyun-Soo Kim
Journal of the Korean Electrochemical Society.2009; 12(1): 34. CrossRef

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Charge-discharge Properties of Positive Active Material Li(Cr0.4Mn0.6)O2: J Korean Inst Electr Electron Mater Eng 2004;17(10):1085-1089. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1085

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Electrochemical Properties of Carbon Nano-tube as the Counter Electrode of Dye-sensitized solar cell: J Korean Inst Electr Electron Mater Eng 2004;17(10):1090-1094. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1090

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Electro-Optical Characteristics of Plastic STN Cell using Low Temperature Process: J Korean Inst Electr Electron Mater Eng 2004;17(10):1095-1099. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1095

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A Study on Electro-optical Characteristics of the Ion Beam Aligned FFS Cell on a Inorganic Thin Film: J Korean Inst Electr Electron Mater Eng 2004;17(10):1100-1106. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1100

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The Fabrication and Properties of Lead-free Transparent Dielectric Thick Films for PDP: J Korean Inst Electr Electron Mater Eng 2004;17(10):1107-1113. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1107

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Repairing of a Defective Metallic Line using Laser CVD Deposited Tungsten Film in TFT LCD: J Korean Inst Electr Electron Mater Eng 2004;17(10):1114-1119. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1114

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New Address Waveform for Improvement of the Priming Effect and the Contrast Ratio: J Korean Inst Electr Electron Mater Eng 2004;17(10):1120-1124. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1120

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A Study on the Improvement of the High Temperature Misfiring in AC PDP: J Korean Inst Electr Electron Mater Eng 2004;17(10):1125-1131. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1125

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High Voltage Engineering : Diagnosis Technique of Surface Contamination Degree for EPDM Insulator according to Variation of Environment Condition: J Korean Inst Electr Electron Mater Eng 2004;17(10):1132-1141. Published online October 1, 2004; DOI: https://doi.org/10.4313/JKEM.2004.17.10.1132

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Volume 17(10); October 2004

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