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"Abrasives concentration"

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"Abrasives concentration"

Effect of Abrasive Particles on Frictional Force and Abrasion in Chemical Mechanical Polishing(CMP)
J Korean Inst Electr Electron Mater Eng 2004;17(10):1049-1055.   Published online October 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.10.1049

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  • Two-Step Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
    Weilei Wang, Weili Liu, Zhitang Song
    ECS Journal of Solid State Science and Technology.2021; 10(7): 074004.     CrossRef
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