Journal of Electrical and Electronic Materials

"Brush contamination"

Effect of PVA Brush Contamination on Post-CMP Cleaning Performance: Han Chul Cho, Min Jong Yuh, Suk Joo Kim, Hae Do Jeong; J Korean Inst Electr Electron Mater Eng 2009;22(2):114-118. Published online February 1, 2009; DOI: https://doi.org/10.4313/JKEM.2009.22.2.114

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Combined Effects of PVA Brush Scrubbing Parameters and Processes on Post-CMP Cross-Contamination
Kwang-Min Han, Sumit Kumar, Mir Jalal Khan, Jae-Hyeong Lee, Tae-Gon Kim, Jin-Goo Park
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Particle removal behavior of micropatterned pad buffing in post-CMP cleaning
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