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"HBr gas"

Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas
Seong Jin Beom, O Seong Song, Hye Seong Lee, Jong Jun Kim
J Korean Inst Electr Electron Mater Eng 2004;17(1):1-6.   Published online January 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.1.001

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  • Parameters and Composition of Plasma in a Mixture of HBr + O2: Model Adjustment and Comparison with Experiment
    M. V. Tsepkin, A. M. Efremov, V. B. Betelin, K.-H. Kwon
    Russian Microelectronics.2026; 55(1): 1.     CrossRef
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