Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas

Seong Jin Beom; O Seong Song; Hye Seong Lee; Jong Jun Kim

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반도체 : 논문 ; HBr/O2 유도결합 플라즈마를 이용한 폴리실리콘 건식식각

범성진, 송오성, 이혜성, 김종준

Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas

Seong Jin Beom, O Seong Song, Hye Seong Lee, Jong Jun Kim

J Electr Electron Mater 2004;17(1):1-6.
Published online: January 1, 2004

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Keywords: HBr gas, O2 gas, polysilicon, Dry etch, ICP etcher, Etch rate

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Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas

J Electr Electron Mater. 2004;17(1):1-6. Published online January 1, 2004

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas

J Electr Electron Mater. 2004;17(1):1-6. Published online January 1, 2004

Articles

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반도체 : 논문 ; HBr/O2 유도결합 플라즈마를 이용한 폴리실리콘 건식식각

Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas

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