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"Heterostructure CMOS"

High Quality Ultrathin Gate Oxides Grown by Low-Temperature Radical Induced Oxidation for High Performance SiGe Heterostructure CMOS Applications
Yeong Ju Song, Sang Hun Kim, Nae Eung Lee, Jin Yeong Kang, Gyu Hwan Sim
J Electr Electron Mater 2003;16(9):765-770.   Published online September 1, 2003
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