Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Page Path

1
results for

"Nano-porous"

Keywords

Publication year

Authors

"Nano-porous"

Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method
Jong Guk Park, Dae Woo Jeon, Mi Jai Lee, Tea Young Lim, Jonghee Hwang, Dong Sik Bae, Jin Ho Kim
J Electr Electron Mater 2015;28(12):821-825.   Published online December 1, 2015
Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.
  • 9 View
  • 0 Download