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Sol-gel법에 의한 단층 반사 방지막 제조

박종국, 전대우, 이미재, 임태영, 황종희, 배동식, 김진호

Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method

Jong Guk Park, Dae Woo Jeon, Mi Jai Lee, Tea Young Lim, Jonghee Hwang, Dong Sik Bae, Jin Ho Kim
J Electr Electron Mater 2015;28(12):821-825.
Published online: December 1, 2015
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Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.

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Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method
J Electr Electron Mater. 2015;28(12):821-825.   Published online December 1, 2015
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method
J Electr Electron Mater. 2015;28(12):821-825.   Published online December 1, 2015
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