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RF power Inductively coupled plasma
WHERE t1.sid in(parameter_dbtbl_keyword '%RF power Inductively coupled plasma%') and t1.xml_status <> 99
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Bias voltage (1)
Electron density (1)
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RF power Inductively coupled plasma (1)
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2004 (1)
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Yong Seong Choe (1)
In Seong Heo (1)
Yeong Hwan Lee (1)
Dae Hui Park (1)
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Bias voltage (1)
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"RF power Inductively coupled plasma"
High Voltage Engineering : Electrical and Optical Characteristics of Inductively Coupled Plasma by Ar Gas Pressure and RF Power
Yong Seong Choe, In Seong Heo, Yeong Hwan Lee, Dae Hui Park
J Electr Electron Mater
2004;17(5):560-566.
Published online May 1, 2004
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